Ti–Si–C–N thin films grown by reactive arc evaporation from Ti3SiC2 cathodes
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چکیده
منابع مشابه
Microstructure evolution of Ti3SiC2 compound cathodes during reactive cathodic arc evaporation
The microstructure evolution and compositional variation of Ti3SiC2 cathode surfaces during reactive cathodic arc evaporation are presented for different process conditions. The results show that phase decomposition takes place in the near-surface region, resulting in a 5–50 m thick converted layer that is affected by the presence of nitrogen in the deposition chamber. This layer consists of tw...
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Iron oxide thin films, with an α-Fe2O3 phase, were deposited by two techniques. The first was evaporation of iron in vacuum, followed by oxidation through annealing in air. The second was reactive evaporation of iron in an oxygen atmosphere. This was also followed by annealing in air. The structural, morphological and chemical properties of the films were investigated. All films were polycrysta...
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Mg2NiH4 thin films have been prepared by activated reactive evaporation in a molecular beam epitaxy system equipped with an atomic hydrogen source. The optical reflection spectra and the resistivity of the films are measured in situ during deposition. In situ grown Mg2NiH4 appears to be stable in vacuum due to the fact that the dehydrogenation of the Mg2NiH4 phase is kinetically blocked. Hydrog...
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ژورنال
عنوان ژورنال: Journal of Materials Research
سال: 2011
ISSN: 0884-2914,2044-5326
DOI: 10.1557/jmr.2011.10